Molecular Flow in an Ion-Implant Vacuum System
Model ID: 10011
This example shows how to model an ion implantation system using the Molecular Flow interface available in the Microfluidics Module. Because it is interactions of outgassing molecules with the beam that produce undesirable species, the average number density of these molecules adjacent to surfaces along the beam path is used as a figure of merit to evaluate the design. Furthermore, because the angle of the wafer to the beam can be modified, the figure of merit must be computed as a function of wafer angle, with rotation about one axis.
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Pressure (color) and flux (contours) on the walls of an ion implantation device |
