Laser Heating of a Silicon Wafer
Model ID: 13835
A silicon wafer is heated up by a laser that moves radially in and out over time. In addition, the wafer itself is rotated on its stage. The incident heat flux from the laser is modeled as a spatially distributed heat source on the surface. The transient thermal response of the wafer is shown. The peak, average, and minimum temperature during the heating process is computed, as well as the temperature variations across the wafer.
|The temperature variation across the wafer is observed. The arrow plot describes the velocity of the wafer.|