Luke T. Gritter, Sergei Yushanov, Jeffrey S. Crompton, and Kyle C. Koppenhoefer
AltaSim Technologies
Columbus, OH
AltaSim Technologies provides engineering consulting services involving advanced multiphysics modeling such as capacitively coupled plasma (CCP). Plasma etching and deposition of thin films, critical processes in the manufacture of advanced microelectronic devices, commonly utilize CCP, in which the plasma is initiated and sustained by an oscillating electric field between two or more electrodes.
Analysis of CCP is difficult due to the dynamic behavior of the plasma and the large number of RF cycles necessary to reach a periodic steady state. By performing one- and two-dimensional simulations of low-frequency RF discharges in axisymmetric CCP reactors for Maxwellian and non-Maxwellian cases using COMSOL Multiphysics, AltaSim Technologies has developed simulations which can be used to assist with the development of new CCP processing technology.
Suggested Stories
Bringing Lab Courses to Remote Learning Students with Simulation Applications
A professor at the New Jersey Institute of Technology built 15 simulation applications for use in chemical engineering ...
WiTricity Leverages Magnetic Resonance for Flexible Wireless Charging
Engineers at WiTricity have developed a flexible wireless charging setup that relies on magnetic resonance and can be ...
Designing Smart Solutions for Gas Flow Devices with Multiphysics Simulation
As India moves toward a reduced dependence on fossil fuels, researchers at Raychem RPG used multiphysics simulation to ...
Optimizing 3D Printing Techniques with Simulation Apps
3D printing has recently revolutionized manufacturing techniques, influencing countless industries and products. The ...
