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Hydrogen plasma modeling in a microwave plasma chemical vapor deposition reactor
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Hydrogen plasma modeling in a microwave plasma chemical vapor deposition reactor

Gayathri Shivkumar, Siva Sashank Tholeti, Majed A Alrefae, Aravind Shaj, Timothy S Fisher, & Alina A Alexeenko,
Purdue University, West Lafayette, IN, USA
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A 2D axisymmetric model of the hydrogen plasma in a Microwave Plasma Chemical Vapor Deposition (MPCVD) system is implemented in COMSOL Multiphysics using the high frequency Maxwell solver and the heat transfer solver. Funer's model is calibrated based on experimental observations. The fractional electron energy loss is determined using BOLSIG+, a Boltzmann equation solver for electrons in weakly ionized gases under a given local electric field.

Please reference the following paper to cite this work:
G. Shivkumar, S. S. Tholeti, M. A. Alrefae, T. S. Fisher, and A. A. Alexeenko, "Analysis of hydrogen plasma in a microwave plasma chemical vapor deposition reactor", Journal of Applied Physics 119, 113301 (2016).

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