Transient Pseudo-3D Model of Multi-Beam Laser Thermal Treatment System

J. Brcka
Technology Development Center
TEL US Holdings, Inc.
Albany, NY
Published in 2011

Laser thermal treatment (LTT) systems have applications in IC fabrication for improving low-k dielectrics properties, polymer curing and resist processing. This contribution deals with a transient model of fast scanning and pulsing laser multi-beam system used in semiconductor processing.

General Heat Transfer application mode formulation with multi-scale modelling approaches are employed. The hope is to predict transient temperature profiles over the semiconductor wafer with uniform processing performance under specific conditions, and to create a flexible simulation tool for process and tool development.