Model of an Argon/Chlorine Inductively Coupled Plasma Reactor with RF Bias

Application ID: 110171

This tutorial model solves for an inductively coupled plasma reactor with RF bias (also known as ICP/CCP reactors) in a mixture of argon/chlorine. The model computes the fluid flow and gas heating. Important aspects and strategies for modeling electronegative discharges are discussed.

This model example illustrates applications of this type that would nominally be built using the following products: