The Application Gallery features COMSOL Multiphysics® tutorial and demo app files pertinent to the electrical, structural, acoustics, fluid, heat, and chemical disciplines. You can use these examples as a starting point for your own simulation work by downloading the tutorial model or demo app file and its accompanying instructions.
Search for tutorials and apps relevant to your area of expertise via the Quick Search feature. Note that many of the examples featured here can also be accessed via the Application Libraries that are built into the COMSOL Multiphysics® software and available from the File menu.
This tutorial model solves for an inductively coupled plasma reactor with RF bias (also known as ICP/CCP reactors) in a mixture of argon/chlorine. The model computes the fluid flow and gas heating. Important aspects and strategies for modeling electronegative discharges are discussed. Read More
This model shows modeling of a sphere falling on a water surface. Specifically, it models the oscillating motion of a buoyant sphere as it falls through air and interacts with the air-water interface to finally float on water. Get more details in our blog post: Modeling a Sphere Falling ... Read More
This tutorial studies the deposition of amorphous silicon using an inductively coupled plasma reactor with a silane/argon gas mixture. It examines how the deposition rate varies across the wafer as a function of silane mole fraction and input power. Read More
A plane electromagnetic wave propagating through free space is incident at an angle upon an infinite dielectric medium. This model computes the reflection and transmission coefficients and compares to the Fresnel equations. Read More
An antenna array is a group of radiating elements. By controlling the phase and magnitude of the input signal assigned to each antenna element and the number of array elements, the radiation pattern can be steered in a desired direction with a preferred level of gain. In this example, a ... Read More
In the semiconductor industry, rapid thermal annealing (RTA) is a semiconductor process step used for the activation of dopants and the interfacial reaction of metal contacts. In principle, the operation involves rapid heating of a wafer from ambient to approximately 1000–1500 K. As soon ... Read More
The present model example is based on Copper Deposition in a Trench model available in Electrodeposition Application Library. The nonuniform deposition along the trench surface leads to formation of a cavity/void. Since the Deformed Geometry interface cannot handle topological changes, ... Read More
Oxide jacking is the process by which reinforced concrete cracks, due to the corrosion of the reinforcing rebar rods. The corrosion process causes growth of an oxide layer on the rebar, which in turn causes internal stresses in the concrete. If the corrosion process is allowed to ... Read More
This tutorial shows how to use the Optimization interface to perform electrode kinetics parameter estimations based on polarization data. A zero-dimensional electrode polarization model is defined that separates kinetics expressions for the metal dissolution and the oxygen reduction ... Read More
The use of Aluminum (Al) isolator is a commonly employed mitigation strategy for galvanic corrosion between magnesium alloy (Mg) and mild steel (MS). The present model demonstrates the effect of Al isolator thickness on galvanic corrosion severity using a parametric study. The electrode ... Read More